Shu Uemura Silk Bloom Restorative Mask, 200 ml

Treatment that restores damaged hair

CHF 76.00

(CHF 380.00 / l, Price shown includes 8,1% VAT. - Excludes delivery costs)

Content: 200 ml

Only 8 items in stock

Delivery by Tuesday, 05 August if you order by Wednesday at 23:59.

Switzerland: Free standard delivery
More information regarding shipping & delivery

Features & Advantages

  • Intensive-care formula
  • For structurally damaged hair
  • Enriched with argan oil

Item no.: Xla-E1602901, EAN: 3474630146570

Frequently bought together with Shu Uemura Delicate Comfort Deep Cleanser, 400 ml

Shu Uemura Silk Bloom Restorative Mask, 200 ml CHF 76.00 (CHF 380.00 / l)
Shu Uemura Delicate Comfort Deep Cleanser, 400 ml CHF 58.76 (CHF 146.90 / l)
Total price: CHF 134.76
Description

The Silk Bloom Restorative Mask has highly restorative and intensive-care properties formulated for damaged hair. This special hair mask is enriched with argan oil that repairs the structure of the hair, reinforces its substances and provides the hair with a silky and resilient feel. Argan oil: the argan tree only flourishes in its natural habitat, Marocco, a sparse and low-moisture region. It only bears fruit after several years. The high-quality oil is derived from roasted and pounded seeds using complex methods. It is known for its reparative and regenerative effects.

Properties:

  • boosts resilience
  • restorative effects
  • nourishing

Hair & scalp types:

  • Suitable for damaged hair and normal hair types.

Application:

  • Apply to clean, towel-dried hair.
  • Leave on for r5 - 10 minutes then rinse thoroughly.
Product Types: Masks
Brand: Shu Uemura
Hair Type : For all hair types
Area of Application : Hair
Ingredients (INCI)

Aqua (Water), Cetearyl Alcohol, Behentrimonium Chloride, Glycerin, Cetyl Esters, Amodimethicone, Isopropyl Alcohol, Argania Spinosa (Argan) Kernel Oil, Methylparaben, Sodium Pca, Trideceth-6, Tocopheryl Acetate, Chlorhexidine Dihydrochloride, Cetrimoniumchlorid, Benzyl Salicylate, Alcohol, Citronellal, Benzyl Alcohol, Cumarin, 2-Oleamido-1,3-Octadecanediol, 2-Oleamido-1,3-Octadecanediol, Safflower Glucoside, Gentiana Lutea (Gentian) Root Extract, Phenoxyethanol, Tocopherol, Bht, Sodium Hydroxide, Parfum (Fragrance)

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Customer Reviews

English reviews written for Shu Uemura Silk Bloom Restorative Mask